What is the difference between Pecvd and CVD?
Plasma-enhanced chemical vapor deposition is a variant of CVD; however, it uses plasma energy instead of only thermal energy to deposit thin films. PECVD can use various materials as coatings, including metals, oxides, or silicon, which may offer more flexibility than CVD.
How plasma is formed in PECVD?
PECVD is a widely used technique to obtain device quality thin films at low substrate temperatures [36]. In PECVD, source gases are decomposed in plasma by the collisions between energetic electrons and gas molecules.
Is Pecvd conformal?
Conformality or Step Coverage ALD, TEOS, HTO, and thermal oxide are very conformal. LTO, PECVD, sputtering, and evaporation are much less conformal.
What is the typical high frequency used in Pecvd?
PECVD at 60 MHz excitation frequency is now used extensively in large area thin film technology and industrial applications [83, 88, 89].
How does atomic layer deposition work?
Atomic layer deposition (ALD) is a vapor phase technique used to deposit thin films onto a substrate. In each alternate pulse, the precursor molecule reacts with the surface in a self-limiting way, this ensures that the reaction stops once all of the reactive sites on the substrate have been used.
What types of substrates can be treated with chemical layer deposition?
Other compounds that are deposited by PACVD include quartz, silicon, silicon nitride and titanium nitride as thin film substrates, dielectrics and insulating layers in electronic applications.
What is the typical high frequency used in PECVD?
Which dopant materials are used in external CVD method?
CVD for molybdenum, tantalum, titanium, nickel is widely used. These metals can form useful silicides when deposited onto silicon. Mo, Ta and Ti are deposited by LPCVD, from their pentachlorides. Nickel, molybdenum, and tungsten can be deposited at low temperatures from their carbonyl precursors.
What does Pcvd stand for?
PCVD
| Acronym | Definition |
|---|---|
| PCVD | Plasma Chemical Vapor Deposition |